1. Etching with atomic precision by using low electron temperature plasma. (19th June 2017) Authors: Dorf, L; Wang, J-C; Rauf, S; Monroy, G A; Zhang, Y; Agarwal, A; Kenney, J; Ramaswamy, K; Collins, K Journal: Journal of physics Issue: Volume 50:Number 27(2017) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗