1. Oxygen plasma cleaning of copper for photocathode applications: A MEIS and XPS study. (November 2022) Authors: Noakes, T.C.Q.; Valizadeh, R.; Hannah, A.N.; Jones, L.B.; Militsyn, B.L.; Mistry, S.; Cropper, M.D.; Rossall, A.; Van den Berg, J.A. Journal: Vacuum Issue: Volume 205(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗