1. A poly-diagnostic study of bipolar high-power magnetron sputtering: role of electrical parameters. (3rd August 2020) Authors: Michiels, M; Godfroid, T; Snyders, R; Britun, N Journal: Journal of physics Issue: Volume 53:Number 43(2020) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Insights on film growth conditions on a floating substrate during reactive Ar/O2 bipolar high power impulse magnetron sputter deposition. (16th February 2023) Authors: Michiels, M; Britun, N; Caillard, A; Thomann, A-L; Snyders, R; Konstantinidis, S Journal: Journal of physics Issue: Volume 56:Number 7(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO2 thin films. (29th July 2021) Authors: Michiels, M; Hemberg, A; Godfroid, T; Douheret, O; Colaux, J L; Moskovkin, P; Lucas, S; Caillard, A; Thomann, A-L; Laha, P; Terryn, H; Voué, M; Panepinto, A; Snyders, R; Konstantinidis, S Journal: Journal of physics Issue: Volume 54:Number 41(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗