1. Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM. (15th November 2017) Authors: Rodriguez, Ph.; Famulok, R.; Le Friec, Y.; Reynard, J.-Ph.; Bozon, B.-N.; Boyer, F.; Dabertrand, K.; Jahan, C.; Favier, S.; Mazel, Y.; Previtali, B.; Gergaud, P.; Nemouchi, F. Journal: Materials science in semiconductor processing Issue: Volume 71(2017) Page Start: 433 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗