1. Influence of magnetic field strength on capacitively coupled CF4 discharge at different pressures. (1st December 2022) Authors: Yang, Shali; Lin, Hanlei; Zhang, Tianxiang; Peng, Yanli; Zhang, Qiang Journal: Plasma sources science & technology Issue: Volume 31:Number 12(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗