Author/Creator: Lim, Junil - British Library Electronic Legal Deposit Catalogue-Journal Issues and Articles Search Results

Author/Creator Lim, Junil

1. Atomic layer deposition of Ru thin films using (2, 4-dimethyloxopentadienyl)(ethylcyclopentadienyl)Ru and the effect of ammonia treatment during the deposition. Issue 21 (29th April 2020)

Authors:: Kwon, Dae Seon; An, Cheol Hyun; Kim, Sang Hyeon; Kim, Dong Gun; Lim, Junil; Jeon, Woojin; Hwang, Cheol Seong
Journal:: Journal of materials chemistry
Issue:: Volume 8:Issue 21(2020)
Page Start:: 6993
Record Type:: Journal Article
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2. Comparison of high-k Y2O3/TiO2 bilayer and Y-doped TiO2 thin films on Ge substrate. (22nd February 2021)

Authors:: Kim, Dong Gun; Kim, Hae-Ryoung; Kwon, Dae Seon; Lim, Junil; Seo, Haengha; Kim, Tae Kyun; Paik, Heewon; Lee, Woongkyu; Hwang, Cheol Seong
Journal:: Journal of physics
Issue:: Volume 54:Number 18(2021)
Page Start:
Record Type:: Journal Article
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3. Leakage Current Control of SrTiO3 Thin Films through Al Doping at the Interface between Dielectric and Electrode Layers via Atomic Layer Deposition. Issue 11 (14th August 2019)

Authors:: Kim, Sang Hyeon; Lee, Woongkyu; An, Cheol Hyun; Kim, Yumin; Kwon, Dae Seon; Kim, Dong-Gun; Cha, Soon Hyung; Cho, Seong Tak; Lim, Junil; Hwang, Cheol Seong
Journal:: Physica status solidi
Issue:: Volume 13:Issue 11(2019)
Page Start:: n/a
Record Type:: Journal Article
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4. Optimized Al-doped TiO2 gate insulator for a metal-oxide-semiconductor capacitor on a Ge substrate. Issue 5 (22nd January 2021)

Authors:: Kim, Dong Gun; An, Cheol Hyun; Kim, Sang Hyeon; Kwon, Dae Seon; Lim, Junil; Jeon, Woojin; Hwang, Cheol Seong
Journal:: Journal of materials chemistry
Issue:: Volume 9:Issue 5(2021)
Page Start:: 1572
Record Type:: Journal Article
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5. The Contrasting Impacts of the Al2O3 and Y2O3 Insertion Layers on the Crystallization of ZrO2 Films for Dynamic Random Access Memory Capacitors (Adv. Electron. Mater. 7/2022). (19th July 2022)

Authors:: Seo, Haengha; Yeu, In Won; Kwon, Dae Seon; Kim, Dong Gun; Lim, Junil; Kim, Tae Kyun; Paik, Heewon; Choi, Jung‐Hae; Hwang, Cheol Seong
Journal:: Advanced Electronic Materials
Issue:: Volume 8:Number 7(2022)
Page Start:: n/a
Record Type:: Journal Article
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6. The Contrasting Impacts of the Al2O3 and Y2O3 Insertion Layers on the Crystallization of ZrO2 Films for Dynamic Random Access Memory Capacitors. (4th April 2022)

Authors:: Seo, Haengha; Yeu, In Won; Kwon, Dae Seon; Kim, Dong Gun; Lim, Junil; Kim, Tae Kyun; Paik, Heewon; Choi, Jung‐Hae; Hwang, Cheol Seong
Journal:: Advanced Electronic Materials
Issue:: Volume 8:Number 7(2022)
Page Start:: n/a
Record Type:: Journal Article
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7. Trap Reduction through O3 Post‐Deposition Treatment of Y2O3 Thin Films Grown by Atomic Layer Deposition on Ge Substrates. (12th January 2021)

Authors:: Kim, Dong Gun; Kwon, Dae Seon; Lim, Junil; Seo, Haengha; Kim, Tae Kyun; Lee, Woongkyu; Hwang, Cheol Seong
Journal:: Advanced Electronic Materials
Issue:: Volume 7:Number 2(2021)
Page Start:: n/a
Record Type:: Journal Article
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