1. Impact of Post‐Lithography Polymer Residue on the Electrical Characteristics of MoS2 and WSe2 Field Effect Transistors. Issue 3 (3rd December 2018) Authors: Liang, Jierui; Xu, Ke; Toncini, Blaec; Bersch, Brian; Jariwala, Bhakti; Lin, Yu‐Chuan; Robinson, Joshua; Fullerton‐Shirey, Susan K. Journal: Advanced materials interfaces Issue: Volume 6:Issue 3(2019) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗