1. Comprehension of Postmetallization Annealed MOCVD-TiO2 on (NH4)2S Treated III-V Semiconductors. (16th December 2012) Authors: Lee, Ming-Kwei; Yen, Chih-Feng Other Names: Lee Kuan-Wei Academic Editor. Journal: Active and passive electronic components Issue: Volume 2012(2012) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Comprehension of Postmetallization Annealed MOCVD-TiO2 on (NH4)2S Treated III-V Semiconductors. (16th December 2012) Authors: Lee, Ming-Kwei; Yen, Chih-Feng Other Names: Lee Kuan-Wei Academic Editor. Journal: Active and passive electronic components Issue: Volume 2012(2012) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition. Issue 6 (15th March 2021) Authors: Hsu, Chia-Hsun; Zhang, Zhi-Xuan; Huang, Pao-Hsun; Wu, Wan-Yu; Ou, Sin-Liang; Lien, Shui-Yang; Huang, Chien-Jung; Lee, Ming-Kwei; Zhu, Wen-Zhang Journal: Ceramics international Issue: Volume 47:Issue 6(2021) Page Start: 8634 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Electrochromic characteristics of niobium-doped titanium oxide film on indium tin oxide/glass by liquid phase deposition. (7th September 2015) Authors: Lee, Ming-Kwei; Lee, Chia-Jung Journal: Japanese journal of applied physics Issue: Volume 54:Number 10(2015:Oct.) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗