1. A self-limiting layer-by-layer etching technique for 2H-MoS2. (7th February 2017) Authors: Lee, Choong Hee; Lee, Edwin W.; McCulloch, William; Jamal-Eddine, Zane; Krishnamoorthy, Sriram; Newburger, Michael J; Kawakami, Roland K.; Wu, Yiying; Rajan, Siddharth Journal: Applied physics express Issue: Volume 10:Number 3(2017) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗