1. Abnormal characteristics of etched profile on thick dielectrics for MEMS in inductively coupled plasma. (August 2019) Authors: Lim, Nomin; Han, Il Ki; Kim, Young-Hwan; Lee, Hyun Woo; Cho, Yunsung; Kim, Jeong-Su; Im, Yeon-Ho; Kwon, Kwang-Ho Journal: Vacuum Issue: Volume 166(2019) Page Start: 45 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Ammonia-based plasma treatment of single-walled carbon nanotube thin films for bio-immobilization. (August 2016) Authors: Lee, Jaemin; Efremov, Alexander; Son, Ryeo Gang; Pack, Seung Pil; Lee, Hyun Woo; Kim, Kwangsoo; Kwon, Kwang-Ho Journal: Carbon Issue: Volume 105(2016) Page Start: 430 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Ammonia-based plasma treatment of single-walled carbon nanotube thin films for bio-immobilization. (August 2016) Authors: Lee, Jaemin; Efremov, Alexander; Son, Ryeo Gang; Pack, Seung Pil; Lee, Hyun Woo; Kim, Kwangsoo; Kwon, Kwang-Ho Journal: Carbon Issue: Volume 105(2016) Page Start: 430 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Anti-adhesive characteristics of CHF3/O2 and C4F8/O2 plasma-modified silicon molds for nanoimprint lithography. (September 2015) Authors: Lee, Jaemin; Lee, Junmyung; Lee, Hyun Woo; Kwon, Kwang-Ho Journal: Materials research bulletin Issue: Volume 69(2015:Sep.) Page Start: 120 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Comparative study of Cl2 + O2 and HBr + O2 plasma chemistries in respect to silicon reactive-ion etching process. (April 2021) Authors: Lim, Nomin; Efremov, Alexander; Kwon, Kwang-Ho Journal: Vacuum Issue: Volume 186(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Etching characteristics of SiC, SiO2, and Si in CF4/CH2F2/N2/Ar inductively coupled plasma: Effect of CF4/CH2F2 mixing ratio. (14th September 2016) Authors: Lee, Jongchan; Efremov, Alexander; Kim, Kwangsoo; Kwon, Kwang-Ho Journal: Japanese journal of applied physics Issue: Volume 55:Number 10(2016:Oct.) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. On mechanisms influencing etching/polymerization balance in multi-component fluorocarbon gas mixtures. (December 2022) Authors: Efremov, Alexander; Son, Hye Jun; Choi, Gilyoung; Kwon, Kwang-Ho Journal: Vacuum Issue: Volume 206(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. On the relationships between plasma chemistry, etching kinetics and etching residues in CF4+C4F8+Ar and CF4+CH2F2+Ar plasmas with various CF4/C4F8 and CF4/CH2F2 mixing ratios. (February 2018) Authors: Lee, Jaemin; Efremov, Alexander; Kwon, Kwang-Ho Journal: Vacuum Issue: Volume 148(2018) Page Start: 214 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. The oxygen-deficiency-dependent Seebeck coefficient and electrical properties of mesoporous La0.7Sr0.3MnO3−x films. Issue 12 (29th February 2016) Authors: Park, Chang-Sun; Lee, Hong-Sub; Shim, Dong Il; Cho, Hyung Hee; Park, Hyung-Ho; Kwon, Kwang-Ho Journal: Journal of materials chemistry Issue: Volume 4:Issue 12(2016) Page Start: 4433 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗