1. Atomic layer deposition of Ru thin films using (2, 4-dimethyloxopentadienyl)(ethylcyclopentadienyl)Ru and the effect of ammonia treatment during the deposition. Issue 21 (29th April 2020) Authors: Kwon, Dae Seon; An, Cheol Hyun; Kim, Sang Hyeon; Kim, Dong Gun; Lim, Junil; Jeon, Woojin; Hwang, Cheol Seong Journal: Journal of materials chemistry Issue: Volume 8:Issue 21(2020) Page Start: 6993 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Comparison of high-k Y2O3/TiO2 bilayer and Y-doped TiO2 thin films on Ge substrate. (22nd February 2021) Authors: Kim, Dong Gun; Kim, Hae-Ryoung; Kwon, Dae Seon; Lim, Junil; Seo, Haengha; Kim, Tae Kyun; Paik, Heewon; Lee, Woongkyu; Hwang, Cheol Seong Journal: Journal of physics Issue: Volume 54:Number 18(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Controlling the Electrical Characteristics of ZrO2/Al2O3/ZrO2 Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition. Issue 3 (3rd December 2018) Authors: An, Cheol Hyun; Lee, Woongkyu; Kim, Sang Hyeon; Cho, Cheol Jin; Kim, Dong‐Gun; Kwon, Dae Seon; Cho, Seong Tak; Cha, Soon Hyung; Lim, Jun Il; Jeon, Woojin; Hwang, Cheol Seong Journal: Physica status solidi Issue: Volume 13:Issue 3(2019) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Effect of the Annealing Temperature of the Seed Layer on the Following Main Layer in Atomic‐Layer‐Deposited SrTiO3 Thin Films. Issue 5 (21st January 2019) Authors: Kim, Sang Hyeon; Lee, Woongkyu; An, Cheol Hyun; Kim, Dong‐Gun; Kwon, Dae Seon; Cho, Seong Tak; Cha, Soon Hyung; Lim, Jun Il; Hwang, Cheol Seong Journal: Physica status solidi Issue: Volume 13:Issue 5(2019) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Leakage Current Control of SrTiO3 Thin Films through Al Doping at the Interface between Dielectric and Electrode Layers via Atomic Layer Deposition. Issue 11 (14th August 2019) Authors: Kim, Sang Hyeon; Lee, Woongkyu; An, Cheol Hyun; Kim, Yumin; Kwon, Dae Seon; Kim, Dong-Gun; Cha, Soon Hyung; Cho, Seong Tak; Lim, Junil; Hwang, Cheol Seong Journal: Physica status solidi Issue: Volume 13:Issue 11(2019) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Optimized Al-doped TiO2 gate insulator for a metal-oxide-semiconductor capacitor on a Ge substrate. Issue 5 (22nd January 2021) Authors: Kim, Dong Gun; An, Cheol Hyun; Kim, Sang Hyeon; Kwon, Dae Seon; Lim, Junil; Jeon, Woojin; Hwang, Cheol Seong Journal: Journal of materials chemistry Issue: Volume 9:Issue 5(2021) Page Start: 1572 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. The Contrasting Impacts of the Al2O3 and Y2O3 Insertion Layers on the Crystallization of ZrO2 Films for Dynamic Random Access Memory Capacitors (Adv. Electron. Mater. 7/2022). (19th July 2022) Authors: Seo, Haengha; Yeu, In Won; Kwon, Dae Seon; Kim, Dong Gun; Lim, Junil; Kim, Tae Kyun; Paik, Heewon; Choi, Jung‐Hae; Hwang, Cheol Seong Journal: Advanced Electronic Materials Issue: Volume 8:Number 7(2022) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. The Contrasting Impacts of the Al2O3 and Y2O3 Insertion Layers on the Crystallization of ZrO2 Films for Dynamic Random Access Memory Capacitors. (4th April 2022) Authors: Seo, Haengha; Yeu, In Won; Kwon, Dae Seon; Kim, Dong Gun; Lim, Junil; Kim, Tae Kyun; Paik, Heewon; Choi, Jung‐Hae; Hwang, Cheol Seong Journal: Advanced Electronic Materials Issue: Volume 8:Number 7(2022) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Trap Reduction through O3 Post‐Deposition Treatment of Y2O3 Thin Films Grown by Atomic Layer Deposition on Ge Substrates. (12th January 2021) Authors: Kim, Dong Gun; Kwon, Dae Seon; Lim, Junil; Seo, Haengha; Kim, Tae Kyun; Lee, Woongkyu; Hwang, Cheol Seong Journal: Advanced Electronic Materials Issue: Volume 7:Number 2(2021) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗