1. Formation of nanocrystalline silicon in SiOx by soft X-ray irradiation at low temperature. (1st February 2017) Authors: Heya, Akira; Kusakabe, Fumito; Matsuo, Naoto; Kanda, Kazuhiro; Kohama, Kazuyuki; Ito, Kazuhiro Journal: Japanese journal of applied physics Issue: Volume 56:Number 3(2017) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗