1. Investigation of non-charging exposure conditions for insulating resist films in electron beam lithography. (15th April 2021) Authors: Kubo, Kento; Kojima, Kentaro; Kono, Yoshinobu; Kotera, Masatoshi Journal: Japanese journal of applied physics Issue: Volume 60:Number SC(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗