1. High-Quality Doped Polycrystalline Silicon Using Low-Pressure Chemical Vapor Deposition (LPCVD). (September 2018) Authors: Padhamnath, Pradeep; Nandakumar, Naomi; Kitz, Buatis Jammaal; Balaji, Nagarajan; Naval, Marvic-John; Shanmugam, Vinodh; Duttagupta, Shubham Journal: Energy procedia Issue: Volume 150(2018) Page Start: 9 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗