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Author/Creator Kim, Hye-Lee

1. Atomic layer deposition of silicon oxide films using bis(dimethylaminomethylsilyl)trimethylsilylamine and ozone: first-principles and experimental study. Issue 45 (15th November 2022)

Authors:
Choi, Yeongchan; Son, Heeju; Khumaini, Khabib; Han, Hyunmin; Roh, Hyeonsu; Kim, Hye-Lee; Lee, Sang-Ick; Lee, Won-Jun
Journal:
Journal of materials chemistry
Issue:
Volume 10:Issue 45(2022)
Page Start:
17377
Record Type:
Journal Article
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2. Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand. Issue 17 (7th April 2022)

Authors:
Kim, Seongyoon; Hidayat, Romel; Roh, Hyeonsu; Kim, Jaemin; Kim, Hye-Lee; Khumaini, Khabib; Park, Mira; Seok, Jang-Hyeon; Park, Jung Woo; Lee, Won-Jun
Journal:
Journal of materials chemistry
Issue:
Volume 10:Issue 17(2022)
Page Start:
6696
Record Type:
Journal Article
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3. Selective etching mechanism of silicon oxide against silicon by hydrogen fluoride: a density functional theory study. Issue 5 (17th January 2023)

Authors:
Hidayat, Romel; Kim, Hye-Lee; Khumaini, Khabib; Chowdhury, Tanzia; Mayangsari, Tirta Rona; Cho, Byungchul; Park, Sangjoon; Lee, Won-Jun
Journal:
Physical chemistry chemical physics
Issue:
Volume 25:Issue 5(2023)
Page Start:
3890
Record Type:
Journal Article
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