1. Inherently Area‐Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity. (10th June 2021) Authors: Lee, Jinseon; Lee, Jeong‐Min; Oh, Hongjun; Kim, Changhan; Kim, Jiseong; Kim, Dae Hyun; Shong, Bonggeun; Park, Tae Joo; Kim, Woo‐Hee Journal: Advanced functional materials Issue: Volume 31:Number 33(2021) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗