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Author/Creator Kil, Deok-Sin

1. Atomic layer chemical vapor deposition of SiO2 thin films using a chlorine-free silicon precursor for 3D NAND applications. Issue 13 (1st July 2021)

Authors:
Baek, GeonHo; Baek, Ji-hoon; Kim, Hye-mi; Lee, Seunghwan; Jin, Yusung; Park, Hyung Soon; Kil, Deok-Sin; Kim, Sangho; Park, Yongjoo; Park, Jin-Seong
Journal:
Ceramics international
Issue:
Volume 47:Issue 13(2021)
Page Start:
19036
Record Type:
Journal Article
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