1. Two-step epitaxial growth of NbON (100) thin films on rutile-type TiO2 (101) substrates and reduction of residual carrier concentration by RF reactive sputtering. Issue 23 (29th May 2019) Authors: Kikuchi, Ryosuke; Nakamura, Toru; Kaneko, Yasushi; Hato, Kazuhito Journal: CrystEngComm Issue: Volume 21:Issue 23(2019) Page Start: 3552 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗