1. Development of UV-curable liquid for in-liquid fluorescence alignment in ultraviolet nanoimprint lithography. (14th May 2018) Authors: Ochiai, Kento; Kikuchi, Eri; Ishito, Yota; Kumagai, Mari; Nakamura, Takahiro; Nakagawa, Masaru Journal: Japanese journal of applied physics Issue: Volume 57:Number 6(2018)Supplement 1 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Silica imprint templates with concave patterns from single-digit nanometers fabricated by electron beam lithography involving argon ion beam milling. (26th April 2017) Authors: Ito, Shunya; Kikuchi, Eri; Watanabe, Masahiko; Sugiyama, Yoshinari; Kanamori, Yoshiaki; Nakagawa, Masaru Journal: Japanese journal of applied physics Issue: Volume 56:Number 6(2017)Supplement 1 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗