1. Influence of stoichiometry on the performance of MIM capacitors from plasma‐assisted ALD SrxTiyOz films. Issue 2 (9th September 2013) Authors: Aslam, N.; Longo, V.; Keuning, W.; Roozeboom, F.; Kessels, W. M. M.; Waser, R.; Hoffmann‐Eifert, S. Journal: Physica status solidi Issue: Volume 211:Issue 2(2014:Feb.) Page Start: 389 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗