1. 3D Atomic Scale Analysis of CMOS type structures for 14 nm UTBB-SOI technology. (23rd September 2015) Authors: Estivill, Robert; Grenier, Adeline; Printemps, Tony; Juhel, Marc; Gregoire, Magali; Caubet, Pierre; Blavette, Didier Journal: Microscopy and microanalysis Issue: Volume 21(2015:Jun.)Supplement 3 Page Start: 521 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. 3D Atomic Scale Analysis of CMOS type structures for 14 nm UTBB-SOI technology. (August 2015) Authors: Estivill, Robert; Grenier, Adeline; Printemps, Tony; Juhel, Marc; Gregoire, Magali; Caubet, Pierre; Blavette, Didier Journal: Microscopy and microanalysis Issue: Volume 21(2015:Jun.)Supplement 3 Page Start: 521 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. A Comparative Analysis of a Si/SiGe Heterojunction-Bipolar Transistors: APT, STEM-EDX and ToF-SIMS. (23rd September 2015) Authors: Estivill, Robert; Chevalier, Pascal; Lorut, Frederic; Juhel, Marc; Clement, Laurent; Servanton, Germain; Avenier, Gregory; Grenier, Adeline; Blavette, Didier Journal: Microscopy and microanalysis Issue: Volume 21(2015:Jun.)Supplement 3 Page Start: 689 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. A Comparative Analysis of a Si/SiGe Heterojunction-Bipolar Transistors: APT, STEM-EDX and ToF-SIMS. (August 2015) Authors: Estivill, Robert; Chevalier, Pascal; Lorut, Frederic; Juhel, Marc; Clement, Laurent; Servanton, Germain; Avenier, Gregory; Grenier, Adeline; Blavette, Didier Journal: Microscopy and microanalysis Issue: Volume 21(2015:Jun.)Supplement 3 Page Start: 689 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Atomic scale investigation of arsenic segregation in high-k metal gate stacks. (1st March 2016) Authors: Estivill, Robert; Juhel, Marc; Gregoire, Magali; Grenier, Adeline; Delaye, Vincent; Blavette, Didier Journal: Scripta materialia Issue: Volume 113(2016) Page Start: 231 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Atomic scale investigation of arsenic segregation in high-k metal gate stacks. (1st March 2016) Authors: Estivill, Robert; Juhel, Marc; Gregoire, Magali; Grenier, Adeline; Delaye, Vincent; Blavette, Didier Journal: Scripta materialia Issue: Volume 113(2016) Page Start: 231 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. Comparative Analysis of Growth Rate Enhancement and Ge Redistribution during Silicon-Germanium Oxidation by Rapid Thermal Oxidation. (18th August 2016) Authors: Rozé, Fabien; Gourhant, Olivier; Blanquet, Elisabeth; Bertin, François; Juhel, Marc; Abbate, Francesco; Pribat, Clement; Duru, Romain Journal: ECS transactions Issue: Volume 75:Number 8(2016) Page Start: 67 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. Highly Microcrystalline Phosphorous‐Doped Si:H Very Thin Films Deposited by RF‐PECVD. Issue 13 (14th May 2022) Authors: Wilson, Alestair; Fourmond, Erwann; Saidi, Bilel; Fornacciari, Benjamin; Brottet, Solène; Juhel, Marc; Gros-Jean, Mickael Journal: Physica status solidi Issue: Volume 219:Issue 13(2022) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Improvement of Boron Doping in SiGe Raised Sources and Drains for FD-SOI Technology by Carbon Incorporation. (18th August 2016) Authors: Labrot, Maxime; Cheynis, Fabien; Barge, David; Juhel, Marc; Müller, Pierre Journal: ECS transactions Issue: Volume 75:Number 8(2016) Page Start: 29 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗