1. In-Line Critical Dimension and Sidewall Roughness Metrology Study for Compound Nanostructure Process Control by in-Line 3D Atomic Force Microscope. (18th August 2016) Authors: Kim, Tae-Gon; Ryu, Heon-Yul; Jo, Ah-jin; Cho, Sang-Joon; Park, Sang-il; Vandeweyer, Tom Journal: ECS transactions Issue: Volume 75:Number 8(2016) Page Start: 761 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗