1. Controlled deposition of plasma‐polyaniline thin film by PECVD: Understanding the influence of aniline to argon ratio. Issue 5 (23rd February 2022) Authors: Pattyn, Cedric; Sciacqua, Dario; Kwiedor, Lukas; Jagodar, Andrea; Strunskus, Thomas; Traeger, Franziska; Lecas, Thomas; Kovacevic, Eva; Berndt, Johannes Journal: Plasma processes and polymers Issue: Volume 19:Issue 5(2022) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗