1. (Invited) Plasma Etching Technology Challenges for Future CMOS Fabrication Based on Microwave ECR Plasma. (31st March 2015) Authors: Izawa, Masaru; Tanaka, Motohiro; Yasui, Naoki; Morimoto, Michikazu Journal: ECS transactions Issue: Volume 66:Number 4(2015) Page Start: 143 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. (Invited) Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication. (14th August 2017) Authors: Shinoda, Kazunori; Miyoshi, Nobuya; Kobayashi, Hiroyuki; Kurihara, Masaru; Izawa, Masaru; Ishikawa, Kenji; Hori, Masaru Journal: ECS transactions Issue: Volume 80:Number 3(2017) Page Start: 3 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate. (28th April 2017) Authors: Miyoshi, Nobuya; Kobayashi, Hiroyuki; Shinoda, Kazunori; Kurihara, Masaru; Watanabe, Tomoyuki; Kouzuma, Yutaka; Yokogawa, Kenetsu; Sakai, Satoshi; Izawa, Masaru Journal: Japanese journal of applied physics Issue: Volume 56:Number 6(2017)Supplement 2 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF3/O2 downstream plasma. (9th September 2019) Authors: Shinoda, Kazunori; Miyoshi, Nobuya; Kobayashi, Hiroyuki; Izawa, Masaru; Ishikawa, Kenji; Hori, Masaru Journal: Journal of physics Issue: Volume 52:Number 47(2019) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗