1. Molecular dynamics simulation of silicon oxidation enhanced by energetic hydrogen ion irradiation. (22nd April 2015) Authors: Mizotani, Kohei; Isobe, Michiro; Fukasawa, Masanaga; Nagahata, Kazunori; Tatsumi, Tetsuya; Hamaguchi, Satoshi Journal: Journal of physics Issue: Volume 48:Number 15(2015) Page Start: 893 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Molecular dynamics simulation of silicon oxidation enhanced by energetic hydrogen ion irradiation. (25th March 2015) Authors: Mizotani, Kohei; Isobe, Michiro; Fukasawa, Masanaga; Nagahata, Kazunori; Tatsumi, Tetsuya; Hamaguchi, Satoshi Journal: Journal of physics Issue: Volume 48:Number 15(2015) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO2, and Si3N4 etching processes. (21st October 2016) Authors: Numazawa, Satoshi; Machida, Ken; Isobe, Michiro; Hamaguchi, Satoshi Journal: Japanese journal of applied physics Issue: Volume 55:Number 11(2016:Nov.) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗