1. A Breakthrough Method for the Effective Conditioning of PVA Brush Used for Post-CMP Process. (1st January 2019) Authors: Lee, Jung-Hwan; Ryu, Heon-Yul; Hwang, Jun-Kil; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo Journal: ECS journal of solid state science and technology Issue: Volume 8:Number 6(6019) Page Start: P307 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. A Breakthrough Method for the Effective Conditioning of PVA Brush Used for Post-CMP Process. (5th June 2019) Authors: Lee, Jung-Hwan; Ryu, Heon-Yul; Hwang, Jun-Kil; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo Journal: ECS journal of solid state science and technology Issue: Volume 8:Number 6(6019) Page Start: P307 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Characterization of Different Cobalt Surfaces and Interactions with Benzotriazole for CMP Application. (13th July 2020) Authors: Ryu, Heon-Yul; Lee, Chan-Hee; Hwang, Jun-Kil; Cho, Hwi-Won; Prasad, Nagendra Yerriboina; Kim, Tae-Gon; Hamada, Satomi; Park, Jin-Goo Journal: ECS journal of solid state science and technology Issue: Volume 9:Number 6(2020) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning. (1st January 2019) Authors: Ryu, Heon-Yul; Cho, Byoung-Jun; Yerriboina, Nagendra Prasad; Lee, Chan-Hee; Hwang, Jun-Kil; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo Journal: ECS journal of solid state science and technology Issue: Volume 8:Number 5(2019) Page Start: P3058 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning. (20th February 2019) Authors: Ryu, Heon-Yul; Cho, Byoung-Jun; Yerriboina, Nagendra Prasad; Lee, Chan-Hee; Hwang, Jun-Kil; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo Journal: ECS journal of solid state science and technology Issue: Volume 8:Number 5(2019) Page Start: P3058 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗