1. A Comprehensive Approach Towards Optimizing the Xenon Plasma Focused Ion Beam Instrument for Semiconductor Failure Analysis Applications. (5th June 2017) Authors: Subramaniam, Srinivas; Huening, Jennifer; Richards, John; Johnson, Kevin Journal: Microscopy and microanalysis Issue: Volume 23:Number 4(2017) Page Start: 769 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗