1. The ultra-thin AlN epitaxy on monolayer WS2 by helicon sputtering at 400 °C. (January 2023) Authors: Huang, Yu-Che; Hsieh, Tung-Chen; Hong, Tz-Ju; Wu, Chia-Hsin; Ho, Yen-Teng; Tsai, Yi-Wei; Lin, Jhih-Min; Kao, Hui-Ling; Chang, Shu-Jui Journal: Vacuum Issue: Volume 207(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗