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Author/Creator Hoffmann, Raik

1. (Invited) Integration Challenges of Ferroelectric Hafnium Oxide Based Embedded Memory. (9th September 2015)

Authors:
Müller, Johannes; Polakowski, Patrick; Paul, Jan; Riedel, Stefan; Hoffmann, Raik; Drescher, Maximilian; Slesazeck, Stefan; Müller, Stefan; Mulaosmanovic, Halid; Schröder, Uwe; Mikolajick, Thomas; Flachowsky, Stefan; Erben, Elke; Smith, Elliot; Binder, Robert; Triyoso, Dina; Metzger, Joachim; Kolo...
Journal:
ECS transactions
Issue:
Volume 69:Number 3(2015)
Page Start:
85
Record Type:
Journal Article
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2. A FeFET with a novel MFMFIS gate stack: towards energy-efficient and ultrafast NVMs for neuromorphic computing. (29th July 2021)

Authors:
Ali, Tarek; Mertens, Konstantin; Kühnel, Kati; Rudolph, Matthias; Oehler, Sebastian; Lehninger, David; Müller, Franz; Revello, Ricardo; Hoffmann, Raik; Zimmermann, Katrin; Kämpfe, Thomas; Czernohorsky, Malte; Seidel, Konrad; Van Houdt, Jan; Eng, Lukas M
Journal:
Nanotechnology
Issue:
Volume 32:Number 42(2021)
Page Start:
Record Type:
Journal Article
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3. A Study on Imprint Behavior of Ferroelectric Hafnium Oxide Caused by High‐Temperature Annealing. Issue 7 (8th March 2023)

Authors:
Sünbül, Ayse; Lehninger, David; Lederer, Maximilian; Mähne, Hannes; Hoffmann, Raik; Bernert, Kerstin; Thiem, Steffen; Schöne, Fred; Döllgast, Moritz; Haufe, Nora; Roy, Lisa; Kämpfe, Thomas; Seidel, Konrad; Eng, Lukas M.
Journal:
Physica status solidi
Issue:
Volume 220:Issue 7(2023)
Page Start:
n/a
Record Type:
Journal Article
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4. Impact of Ferroelectric Layer Thickness on Reliability of Back‐End‐of‐Line‐Compatible Hafnium Zirconium Oxide Films. Issue 4 (6th October 2022)

Authors:
Sünbül, Ayse; Lehninger, David; Hoffmann, Raik; Olivo, Ricardo; Prabhu, Aditya; Schöne, Fred; Kühnel, Kati; Döllgast, Moritz; Haufe, Nora; Roy, Lisa; Kämpfe, Thomas; Seidel, Konrad; Eng, Lukas M.
Journal:
Advanced engineering materials
Issue:
Volume 25:Issue 4(2023)
Page Start:
n/a
Record Type:
Journal Article
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5. Piezoelectric Response of Polycrystalline Silicon‐Doped Hafnium Oxide Thin Films Determined by Rapid Temperature Cycles. (29th January 2020)

Authors:
Mart, Clemens; Kämpfe, Thomas; Hoffmann, Raik; Eßlinger, Sophia; Kirbach, Sven; Kühnel, Kati; Czernohorsky, Malte; Eng, Lukas M.; Weinreich, Wenke
Journal:
Advanced Electronic Materials
Issue:
Volume 6:Number 3(2020)
Page Start:
n/a
Record Type:
Journal Article
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6. Tuning Hyrbrid Ferroelectric and Antiferroelectric Stacks for Low Power FeFET and FeRAM Applications by Using Laminated HSO and HZO films. (5th January 2022)

Authors:
Ali, Tarek; Lehninger, David; Lederer, Maximilian; Li, Songrui; Kühnel, Kati; Mart, Clemens; Mertens, Konstantin; Hoffmann, Raik; Olivo, Ricardo; Emara, Jennifer; Biedermann, Kati; Metzger, Joachim; Binder, Robert; Czernohorsky, Malte; Kämpfe, Thomas; Müller, Johannes; Seidel, Konrad; Eng, Lukas M.
Journal:
Advanced Electronic Materials
Issue:
Volume 8:Number 5(2022)
Page Start:
n/a
Record Type:
Journal Article
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