1. A Chemical Vapor Deposition Diamond Reactor for Controlled Thin‐Film Growth with Sharp Layer Interfaces. Issue 4 (12th August 2022) Authors: Schätzle, Philip; Reinke, Philipp; Herrling, David; Götze, Arne; Lindner, Lukas; Jeske, Jan; Kirste, Lutz; Knittel, Peter Other Names: Nesládek Miloš guestEditor.; Pobedinskas Paulius guestEditor. Journal: Physica status solidi Issue: Volume 220:Issue 4(2023) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. A Chemical Vapor Deposition Diamond Reactor for Controlled Thin‐Film Growth with Sharp Layer Interfaces. Issue 4 (21st February 2023) Authors: Schätzle, Philip; Reinke, Philipp; Herrling, David; Götze, Arne; Lindner, Lukas; Jeske, Jan; Kirste, Lutz; Knittel, Peter Other Names: Nesládek Miloš guestEditor.; Pobedinskas Paulius guestEditor. Journal: Physica status solidi Issue: Volume 220:Issue 4(2023) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗