1. Atomic layer deposition of a ruthenium thin film using a precursor with enhanced reactivity. Issue 11 (12th March 2021) Authors: Hwang, Jeong Min; Han, Seung-Min; Yang, Hanuel; Yeo, Seungmin; Lee, Seung-Hun; Park, Chan Woo; Kim, Gun Hwan; Park, Bo Keun; Byun, Younghun; Eom, Taeyong; Chung, Taek-Mo Journal: Journal of materials chemistry Issue: Volume 9:Issue 11(2021) Page Start: 3820 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗