1. Ferroelectricity in undoped-HfO2 thin films induced by deposition temperature control during atomic layer deposition. Issue 28 (4th July 2016) Authors: Kim, K. D.; Park, M. H.; Kim, H. J.; Kim, Y. J.; Moon, T.; Lee, Y. H.; Hyun, S. D.; Gwon, T.; Hwang, C. S. Journal: Journal of materials chemistry Issue: Volume 4:Issue 28(2016) Page Start: 6864 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗