1. Growth modulation of atomic layer deposition of HfO2 by combinations of H2O and O3 reactants. Issue 48 (25th November 2021) Authors: Ko, Byeong Guk; Nguyen, Chi Thang; Gu, Bonwook; Khan, Mohammad Rizwan; Park, Kunwoo; Oh, Hongjun; Park, Jungwon; Shong, Bonggeun; Lee, Han-Bo-Ram Journal: Dalton transactions Issue: Volume 50:Issue 48(2021) Page Start: 17935 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗