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2. Modelling of the Elementary Steps Involved in the Aluminum Electrochemical Deposition from Ionic Liquid Based Solution: The BMImCl/AlCl3 System. Issue 1 (11th December 2019)

3. Modelling of the Elementary Steps Involved in the Aluminum Electrochemical Deposition from Ionic Liquid Based Solution: The BMImCl/AlCl3 System. Issue 1 (1st January 2020)

4. Morphology and Composition of Cu2S Ultra-Thin Films Deposited by E-ALD. (25th October 2017)

6. Selective Electrodesorption-Based Atomic Layer Deposition (SEBALD) of Bismuth under Morphological Control. (1st January 2018)

7. Selective Electrodesorption-Based Atomic Layer Deposition (SEBALD) of Bismuth under Morphological Control. (January 2018)