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- Gebhardt, Jens [remove] 1
- 363.7394 1
- Abbreviations: A Pre-exponential factor [L mol−1 s−1] -- α2 Fraction of the deprotonated form of a micropollutant at a given pH [-] -- AOP Advanced oxidation process -- c Speed of light [m s−1] -- c0, MP Concentration of a micropollutant before UV/H2O2 treatment [mol L−1] -- cMP Concentration of a micropollutant after UV/H2O2 treatment [mol L−1] -- CBD Collimated beam device -- CTOH Hydroxyl radical exposure [mol L−1 s] -- DOC Dissolved organic carbon -- ε Decadic molar absorption coefficient at 254 nm [cm−1] -- ε1 Decadic molar absorption coefficient at 254 nm of the deprotonated form of a micropollutant [cm−1] -- ε2 Decadic molar absorption coefficient at 254 nm of the protonated form of a micropollutant [cm−1] -- E Ultraviolet fluence rate [W m−2] -- Ea Activation energy [J mol−1] -- h Planck's constant [J s] -- H Ultraviolet fluence [J m−2] -- kOH Second-order rate constant for the reaction with hydroxyl radicals [L mol−1 s−1] -- kUV Fluence-based rate constant for direct photolysis [m2 J−1] -- λ Wavelength [m] -- NA Avogadro number [einstein−1] -- MP Micropollutant -- OH Hydroxyl radical -- Φ Quantum yield at 254 nm [mol einstein−1] -- R Ideal gas constant [J K−1 mol−1] -- S Pseudo-first-order hydroxyl radical scavenging rate constant of matrix [s−1] -- T Absolute temperature [K] -- TIC Total inorganic carbon -- u2 Combined standard uncertainty [-] -- uc2 Combined standard variance [-] -- UV Ultraviolet -- UVA Ultraviolet absorbance at 254 nm normalized to the path length [m−1] -- Δ% Difference between % predicted abatement and % measured abatement [-] 1
- OH-radical exposure -- UV/H2O2 AOP -- in-situ probe compounds -- kinetic modeling -- sensitivity analysis -- water treatment 1
- Water -- Pollution -- Research -- Periodicals 1