1. Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study. Issue 3 (8th January 2020) Authors: Beladiya, Vivek; Becker, Martin; Faraz, Tahsin; Kessels, W. M. M. (Erwin); Schenk, Paul; Otto, Felix; Fritz, Torsten; Gruenewald, Marco; Helbing, Christian; Jandt, Klaus D.; Tünnermann, Andreas; Sierka, Marek; Szeghalmi, Adriana Journal: Nanoscale Issue: Volume 12:Issue 3(2020) Page Start: 2089 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties. (28th February 2019) Authors: Faraz, Tahsin; Arts, Karsten; Karwal, Saurabh; Knoops, Harm C M; Kessels, Wilhelmus M M Journal: Plasma sources science & technology Issue: Volume 28:Number 2(2019:Apr.) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗