1. Expanding Thermal Plasma Deposition of Al‐Doped ZnO: On the Effect of the Plasma Chemistry on Film Growth Mechanisms. Issue 1 (30th November 2015) Authors: Williams, Benjamin L.; Ponomarev, Mikhail V.; Verheijen, Marcel A.; Knoops, Harm C. M.; Chandramohan, Abhinaya; Duval, Leo; van de Sanden, Mauritius C. M.; Creatore, Mariadriana Journal: Plasma processes and polymers Issue: Volume 13:Issue 1 (2016) Page Start: 54 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗