1. Design of high‐χ block copolymers for lithography. Issue 2 (30th August 2014) Authors: Durand, William J.; Blachut, Gregory; Maher, Michael J.; Sirard, Stephen; Tein, Summer; Carlson, Matthew C.; Asano, Yusuke; Zhou, Sunshine X.; Lane, Austin P.; Bates, Christopher M.; Ellison, Christopher J.; Willson, C. Grant Journal: Journal of polymer science Issue: Volume 53:Issue 2(2015:Jan.) Page Start: 344 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes. Issue 47 (28th September 2015) Authors: Pandav, Gunja; Durand, William J.; Ellison, Christopher J.; Willson, C. Grant; Ganesan, Venkat Journal: Soft matter Issue: Volume 11:Issue 47(2015) Page Start: 9107 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗