1. Improved PECVD SixNy film as a mask layer for deep wet etching of the silicon. (6th September 2017) Authors: Han, Jianqiang; Yin, Yi Jun; Han, Dong; Dong, LiZhen Journal: Materials research express Issue: Volume 4:Number 9(2017) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗