1. Excellent passivation of thin silicon wafers by HF‐free hydrogen plasma etching using an industrial ICPECVD tool. Issue 1 (17th November 2014) Authors: Tang, Muzhi; Ge, Jia; Wong, Johnson; Ling, Zhi Peng; Dippell, Torsten; Zhang, Zhenhao; Huber, Marco; Doerr, Manfred; Hohn, Oliver; Wohlfart, Peter; Aberle, Armin Gerhard; Mueller, Thomas Journal: Physica status solidi Issue: Volume 9:Issue 1(2015:Jan.) Page Start: 47 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide. (1st June 2014) Authors: Ge, Jia; Tang, Muzhi; Wong, Johnson; Zhang, Zhenhao; Dippell, Torsten; Doerr, Manfred; Hohn, Oliver; Huber, Marco; Wohlfart, Peter; Aberle, Armin G.; Mueller, Thomas Other Names: Kyaw Aung Ko Ko Academic Editor. Journal: International journal of photoenergy Issue: Volume 2014(2014) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗