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Author/Creator Dallorto, Stefano

2. Atomic layer etching of SiO2 with Ar and CHF 3 plasmas: A self‐limiting process for aspect ratio independent etching. Issue 9 (22nd May 2019)

Authors:
Dallorto, Stefano; Goodyear, Andy; Cooke, Mike; Szornel, Julia E.; Ward, Craig; Kastl, Christoph; Schwartzberg, Adam; Rangelow, Ivo W.; Cabrini, Stefano
Other Names:
Hamaguchi Satoshi guestEditor.; Agarwal Sumit guestEditor.; Zajickova Lenka guestEditor.
Journal:
Plasma processes and polymers
Issue:
Volume 16:Issue 9(2019)
Page Start:
n/a
Record Type:
Journal Article
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