1. Analysis of the negative charges injected into a SiO2/SiNx stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface. (4th October 2020) Authors: Min, Kwan Hong; Hwang, Jeong‐Mo; Cho, Eunwan; Song, Hee‐eun; Park, Sungeun; Rohatgi, Ajeet; Kim, Donghwan; Lee, Hae‐Seok; Kang, Yoonmook; Ok, Young‐Woo; Kang, Min Gu Journal: Progress in photovoltaics Issue: Volume 29:Number 1(2021) Page Start: 54 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗