1. Chlorine-mediated atomic layer deposition of HfO2 on graphene. Issue 48 (25th November 2021) Authors: Wilson, Peter M.; Chin, Matt L.; Ekuma, Chinedu E.; Najmaei, Sina; Price, Katherine M.; Schiros, Theanne; Dubey, Madan; Hone, James Journal: Journal of materials chemistry Issue: Volume 9:Issue 48(2021) Page Start: 17437 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗