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Author/Creator Bittel, Brad C.

1. Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability. (August 2016)

Authors:
Mutch, Michael J.; Pomorski, Thomas; Bittel, Brad C.; Cochrane, Corey J.; Lenahan, Patrick M.; Liu, Xin; Nemanich, Robert J.; Brockman, Justin; French, Marc; Kuhn, Markus; French, Benjamin; King, Sean W.
Journal:
Microelectronics and reliability
Issue:
Volume 63(2016)
Page Start:
201
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

2. Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability. (August 2016)

Authors:
Mutch, Michael J.; Pomorski, Thomas; Bittel, Brad C.; Cochrane, Corey J.; Lenahan, Patrick M.; Liu, Xin; Nemanich, Robert J.; Brockman, Justin; French, Marc; Kuhn, Markus; French, Benjamin; King, Sean W.
Journal:
Microelectronics and reliability
Issue:
Volume 63(2016)
Page Start:
201
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

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