1. Morphology controlling of 〈111〉-3C–SiC films by HMDS flow rate in LCVD. Issue 5 (18th January 2019) Authors: Xu, Qingfang; Tu, Rong; Sun, Qingyun; Yang, Meijun; Li, Qizhong; Zhang, Song; Zhang, Lianmeng; Goto, Takashi; Ohmori, Hitoshi; Shi, Ji; Li, Haiwen; Kosinova, Marina; Bikramjit, Basu Journal: RSC advances Issue: Volume 9:Issue 5(2019) Page Start: 2426 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗