1. Nearly Anhydrous Undissociated HF for the Removal of Hf / Ta / Zr Based Polymers after Plasma Etch, Selectively to Aluminum. (15th August 2017) Authors: Cazes, Marine; Broussous, Lucile; Garnier, Philippe; Pizzetti, Christian; Gabette, Laurence; Besson, Pascal Journal: ECS transactions Issue: Volume 80:Number 2(2017) Page Start: 199 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗