1. Comprehensive effect of grain size and original target morphology on sputtering behavior of magnetron sputtering target. (April 2023) Authors: Yi, Chen-Xi; Zhang, Hao-Tian; Wang, Shuai-Kang; Han, Gui-Sheng; Liu, Zhi-Ling; Tian, Ye-Fei; Bao, Ming-Dong Journal: Vacuum Issue: Volume 210(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Effect of target grain size on target sputter etching morphology and performance. (July 2022) Authors: Wang, Shuai-Kang; Yang, Wen-Hao; Wang, Yu-Peng; Zhao, Guo-Hua; Zhan, Shang-Song; Wang, Duo; Tang, Bin; Bao, Ming-Dong Journal: Vacuum Issue: Volume 201(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗