1. Determination of etching parameters for pulsed XeF2 etching of silicon using chamber pressure data. (15th February 2018) Authors: Sarkar, Dipta; Baboly, M G; Elahi, M M; Abbas, K; Butner, J; Piñon, D; Ward, T L; Hieber, Tyler; Schuberth, Austin; Leseman, Z C Journal: Journal of micromechanics and microengineering Issue: Volume 28:Number 4(2018:Apr.) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗