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Author/Creator Astakhov, D I

1. CONFERENCES AND SYMPOSIA : Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences). (28th May 2019)

Authors:
Abramenko, D B; Antsiferov, P S; Astakhov, D I; Vinokhodov, A Yu; Vichev, I Yu; Gayasov, R R; Grushin, A S; Dorokhin, L A; Ivanov, V V; Kim, D A; Koshelev, K N; Krainov, P V; Krivokorytov, M S; Krivtsun, V M; Lakatosh, B V; Lash, A A; Medvedev, V V; Ryabtsev, A N; Sidelnikov, Yu V; Snegirev, E P
Journal:
Physics Uspekhi
Issue:
Volume 62:Number 3(2019:Mar.)
Page Start:
304
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

6. Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences). (March 2019)

Authors:
Abramenko, D B; Antsiferov, P S; Astakhov, D I; Vinokhodov, A Yu; Vichev, I Yu; Gayazov, R R; Grushin, A S; Dorokhin, L A; Ivanov, V V; Kim, D A; Koshelev, K N; Krainov, P V; Krivokorytov, M S; Krivtsun, V M; Lakatosh, B V; Lash, A A; Medvedev, V V; Ryabtsev, A N; Sidelnikov, Yu V; Snegirev, E P
Journal:
Physics Uspekhi
Issue:
Volume 62:Number 3(2019:Mar.)
Page Start:
304
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗