1. Comparative study of the sidewall shape and proximity effect of the AR-N 7520 negative electron beam resist. Issue 1 (1st March 2022) Authors: Kostic, I; Vutova, K; Koleva, E; Bencurova, A; Konecnikova, A; Andok, R Journal: Journal of physics Issue: Volume 2240:Issue 1(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Optimisation criteria for the process electron beam lithography of negative AR-N7520 resists. Issue 1 (1st February 2023) Authors: Koleva, E; Kostic, I; Andok, R; Vutova, K; Bencurova, A; Konecnikova, A Journal: Journal of physics Issue: Volume 2443:Issue 1(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Study and comparison of resist characteristics for different negative tone electron beam resists. Issue 1 (1st February 2023) Authors: Andok, R; Vutova, K; Bencurova, A; Kostic, I; Koleva, E Journal: Journal of physics Issue: Volume 2443:Issue 1(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Study of the new CSAR62 positive tone electron-beam resist at 40 keV electron energy. (March 2016) Authors: Andok, R; Bencurova, A; Vutova, K; Koleva, E; Nemec, P; Hrkut, P; Kostic, I; Mladenov, G Journal: Journal of physics Issue: Volume 700(2016) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗